Beneficial defects: Exploiting the intrinsic polishing-induced wafer roughness for the catalyst-free growth of Ge in-plane nanowires
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Autor(in)
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Datum
2014Typ
- Journal Article
ETH Bibliographie
yes
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Abstract
We outline a metal-free fabrication route of in-plane Ge nanowires on Ge(001) substrates. By positively exploiting the polishing-induced defects of standard-quality commercial Ge(001) wafers, micrometer-length wires are grown by physical vapor deposition in ultra-high-vacuum environment. The shape of the wires can be tailored by the epitaxial strain induced by subsequent Si deposition, determining a progressive transformation of the wires in SiGe faceted quantum dots. This shape transition is described by finite element simulations of continuous elasticity and gives hints on the equilibrium shape of nanocrystals in the presence of tensile epitaxial strain. Mehr anzeigen
Persistenter Link
https://doi.org/10.3929/ethz-b-000086516Publikationsstatus
publishedExterne Links
Zeitschrift / Serie
Nanoscale Research LettersBand
Seiten / Artikelnummer
Verlag
SpringerThema
Nanowires; Epitaxy; Silicon; Germanium; Quantum dotsOrganisationseinheit
03986 - Gambardella, Pietro / Gambardella, Pietro
ETH Bibliographie
yes
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