Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD
dc.contributor.author
Grüniger, A.
dc.contributor.author
Bieder, Andrea
dc.contributor.author
Sonnenfeld, Axel
dc.contributor.author
Rudolf von Rohr, Philipp
dc.contributor.author
Müller, Ulrich
dc.contributor.author
Hauert, Roland
dc.date.accessioned
2017-06-08T15:14:06Z
dc.date.available
2017-06-08T15:14:06Z
dc.date.issued
2006
dc.identifier.issn
0257-8972
dc.identifier.issn
1879-3347
dc.identifier.other
10.1016/j.surfcoat.2005.03.044
dc.identifier.uri
http://hdl.handle.net/20.500.11850/769
dc.language.iso
en
dc.publisher
Elsevier
dc.subject
Silicon oxide barrier coatings
dc.subject
Plasma-enhanced chemical vapour deposition (PECVD)
dc.subject
Microwave
dc.subject
RF
dc.subject
X-ray photoelectron spectroscopy (XPS)
dc.subject
Atomic force microscopy (AFM)
dc.title
Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD
dc.type
Journal Article
ethz.journal.title
Surface and Coatings Technology
ethz.journal.volume
200
ethz.journal.issue
14-15
ethz.journal.abbreviated
Surf. Coat. Technol.
ethz.pages.start
4564
ethz.pages.end
4571
ethz.notes
Received 10 February 2005, Accepted 30 March 2005, Available online 23 May 2005.
ethz.identifier.wos
ethz.identifier.scopus
ethz.identifier.nebis
000035352
ethz.publication.place
Amsterdam
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.date.deposited
2017-06-08T15:14:12Z
ethz.source
ECIT
ethz.identifier.importid
imp59364b319802841834
ethz.ecitpid
pub:10531
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T17:54:34Z
ethz.rosetta.lastUpdated
2024-02-01T13:54:47Z
ethz.rosetta.versionExported
true
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