Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD

Grüniger, A.; Bieder, Andrea; Sonnenfeld, Axel; Rudolf von Rohr, Philipp; Müller, Ulrich; Hauert, Roland

doi:10.1016/j.surfcoat.2005.03.044

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Author

Grüniger, A.

Bieder, Andrea

Sonnenfeld, Axel

Rudolf von Rohr, Philipp

Müller, Ulrich

Hauert, Roland

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Date

2006

Type

Journal Article

Citations

Cited 77 times in Scopus

ETH Bibliography

yes

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Publication status

published

External links

https://doi.org/10.1016/j.surfcoat.2005.03.044

Journal / series

Surface and Coatings Technology

Volume

200(14-15)

Pages / Article No.

4564 - 4571

Publisher

Elsevier

Subject

Silicon oxide barrier coatings; Plasma-enhanced chemical vapour deposition (PECVD); Microwave; RF; X-ray photoelectron spectroscopy (XPS); Atomic force microscopy (AFM)

Organisational unit

03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)

Notes

Received 10 February 2005, Accepted 30 March 2005, Available online 23 May 2005.

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Citations

Cited 77 times in Scopus

ETH Bibliography

yes

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