Surface chemistry and optimization of focused ion beam iodine-enhanced etching of indium phosphide
dc.contributor.author
Callegari, Victor
dc.contributor.author
Nellen, Philipp M.
dc.contributor.author
Yang, Tianhe
dc.contributor.author
Hauert, Roland
dc.contributor.author
Müller, Ulrich
dc.contributor.author
Hernandez-Ramirez, Francisco
dc.contributor.author
Sennhauser, Urs
dc.date.accessioned
2017-06-10T16:29:14Z
dc.date.available
2017-06-10T16:29:14Z
dc.date.issued
2007-09
dc.identifier.issn
0169-4332
dc.identifier.issn
1873-5584
dc.identifier.other
10.1016/j.apsusc.2007.05.026
dc.identifier.uri
http://hdl.handle.net/20.500.11850/66297
dc.language.iso
en
dc.publisher
Elsevier
dc.subject
Focused ion beam
dc.subject
Indium phosphide
dc.subject
Sputtering rate
dc.subject
Gas-enhanced etching
dc.subject
Beam scanning strategy
dc.title
Surface chemistry and optimization of focused ion beam iodine-enhanced etching of indium phosphide
dc.type
Journal Article
ethz.journal.title
Applied Surface Science
ethz.journal.volume
253
ethz.journal.issue
22
ethz.journal.abbreviated
Appl. Surf. Sci.
ethz.pages.start
8969
ethz.pages.end
8973
ethz.notes
Received 22 December 2006, Accepted 8 May 2007, Available online 18 May 2007.
ethz.identifier.wos
ethz.identifier.nebis
000031422
ethz.publication.place
Amsterdam
ethz.publication.status
published
ethz.date.deposited
2017-06-10T16:31:35Z
ethz.source
ECIT
ethz.identifier.importid
imp5936508dcac1791773
ethz.ecitpid
pub:105650
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-12T17:11:30Z
ethz.rosetta.lastUpdated
2018-08-02T11:49:25Z
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true
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