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dc.contributor.author
Kubrin, Roman
dc.contributor.author
Tricoli, Antonio
dc.contributor.author
Camenzind, Adrian
dc.contributor.author
Pratsinis, Sotiris E.
dc.contributor.author
Bauhofer, Wolfgang
dc.date.accessioned
2019-03-26T11:31:58Z
dc.date.available
2017-06-19T13:23:41Z
dc.date.available
2019-03-26T11:31:58Z
dc.date.issued
2010-05-07
dc.identifier.issn
1367-2630
dc.identifier.other
10.1088/0957-4484/21/22/225603
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/162125
dc.identifier.doi
10.3929/ethz-b-000162125
dc.description.abstract
Screens of Y2O3:Eu3 + -nanophosphor (dBET = 24 nm) with coating densities in the range 0.23–3.8 mg cm − 2 were obtained by flame aerosol deposition (FAD) from nitrate-based precursors. The average deposition rate was 0.22 mg cm − 2 min − 1. Porosity of the obtained deposits was 0.973 ± 0.004. Light scattering of the coatings in the visible range showed a Rayleigh-like dependence on wavelength and, in comparison to the screens made of the commercial micrometer-sized phosphor powder (dSEM = 4 µm), was reduced by up to two orders of magnitude. As a result, the nanophosphor coatings maintained nearly constant brightness in a very wide range of coating densities. Furthermore, it should be expected that a substantially improved screen resolution can be achieved with such screens. For excitation at a wavelength of 254 nm, the maximum brightness of the FAD-deposited (Y0.92Eu0.08)2O3 phosphor screens in the transmission mode was nearly one third of that of the screens made of the commercial phosphor. It was demonstrated that light reflection from the supporting substrate and porosity of the coating significantly influence its photoluminescent performance.
en_US
dc.format
application/pdf
en_US
dc.language.iso
en
en_US
dc.publisher
IOP Publishing
dc.rights.uri
http://creativecommons.org/licenses/by/3.0/
dc.title
Flame aerosol deposition of Y2O3:Eu nanophosphor screens and their photoluminescent performance
en_US
dc.type
Journal Article
dc.rights.license
Creative Commons Attribution 3.0 Unported
ethz.journal.title
New Journal of Physics
ethz.journal.volume
21
en_US
ethz.journal.issue
22
en_US
ethz.journal.abbreviated
New J. Phys.
ethz.pages.start
043054
en_US
ethz.size
7 p.
en_US
ethz.version.deposit
publishedVersion
en_US
ethz.identifier.wos
ethz.identifier.nebis
001997538
ethz.publication.place
London
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02668 - Inst. f. Energie- und Verfahrenstechnik / Inst. Energy and Process Engineering::03510 - Pratsinis, Sotiris E. / Pratsinis, Sotiris E.
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02668 - Inst. f. Energie- und Verfahrenstechnik / Inst. Energy and Process Engineering::03510 - Pratsinis, Sotiris E. / Pratsinis, Sotiris E.
ethz.date.deposited
2017-06-19T13:24:11Z
ethz.source
ECIT
ethz.identifier.importid
imp59364c8a0dd5f75581
ethz.ecitpid
pub:30289
ethz.eth
yes
en_US
ethz.availability
Open access
en_US
ethz.rosetta.installDate
2017-07-26T20:40:00Z
ethz.rosetta.lastUpdated
2024-02-02T07:25:34Z
ethz.rosetta.versionExported
true
ethz.COinS
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