Measuring stresses in thin metal films by means of Raman microscopy using silicon as a strain gage material

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Author

Date

2009

Type

Journal Article

ETH Bibliography

yes

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Publication status

published

External links

Journal / series

Journal of Raman Spectroscopy

Volume

40(12)

Pages / Article No.

1849 - 1857

Publisher

Wiley

Subject

Raman microscopy; grain growth; thin film; silicon; thermal stresses

Organisational unit

03692 - Spolenak, Ralph / Spolenak, Ralph

Notes

Received 3 February 2009, Accepted 28 March 2009, Published Online 26 May 2009.

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