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dc.contributor.author
Quan, Wei
dc.contributor.author
Flückiger, Ralf
dc.contributor.author
Alexandrova, Maria
dc.contributor.author
Bolognesi, Colombo R.
dc.date.accessioned
2019-04-26T09:18:41Z
dc.date.available
2017-06-12T20:57:53Z
dc.date.available
2018-10-26T14:38:31Z
dc.date.available
2019-04-26T09:18:41Z
dc.date.issued
2017
dc.identifier.isbn
978-1-893580-27-5
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/130674
dc.language.iso
en
en_US
dc.publisher
CS MANTECH
en_US
dc.subject
edge roughness
en_US
dc.subject
ion-milling
en_US
dc.subject
ion-sputtering
en_US
dc.subject
InP/GaAsSb DHBTs
en_US
dc.title
Comparison of Ion-Milling and IonSputtering to Remove Edge Roughness of EBL Defined Emitter Metallization in InP/GaAsSb DHBTs
en_US
dc.type
Conference Paper
ethz.book.title
2017 International Conference on Compound Semiconductor MANufacturing TECHnology. Digest of Papers
en_US
ethz.pages.start
381
en_US
ethz.pages.end
384
en_US
ethz.size
4 p.
en_US
ethz.event
32nd International Conference on Compound Semiconductor Manufacturing Technology (CS ManTech 2017)
en_US
ethz.event.location
Indian Wells, CA, US
en_US
ethz.event.date
May 22-25, 2017
en_US
ethz.publication.place
Beaverton, OR
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::03721 - Bolognesi, Colombo / Bolognesi, Colombo
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00003 - Schulleitung und Dienste::00022 - Bereich VP Forschung / Domain VP Research::02205 - FIRST-Lab / FIRST Center for Micro- and Nanoscience
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::03721 - Bolognesi, Colombo / Bolognesi, Colombo
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00003 - Schulleitung und Dienste::00022 - Bereich VP Forschung / Domain VP Research::02205 - FIRST-Lab / FIRST Center for Micro- and Nanoscience
ethz.date.deposited
2017-06-12T20:58:28Z
ethz.source
ECIT
ethz.identifier.importid
imp5936556ceb68b36833
ethz.ecitpid
pub:193694
ethz.eth
yes
en_US
ethz.availability
Metadata only
en_US
ethz.rosetta.installDate
2018-10-26T14:38:38Z
ethz.rosetta.lastUpdated
2024-02-02T07:44:37Z
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.atitle=Comparison%20of%20Ion-Milling%20and%20IonSputtering%20to%20Remove%20Edge%20Roughness%20of%20EBL%20Defined%20Emitter%20Metallization%20in%20InP/GaAsSb%20DHBTs&rft.date=2017&rft.spage=381&rft.epage=384&rft.au=Quan,%20Wei&Fl%C3%BCckiger,%20Ralf&Alexandrova,%20Maria&Bolognesi,%20Colombo%20R.&rft.isbn=978-1-893580-27-5&rft.genre=proceeding&rft.btitle=2017%20International%20Conference%20on%20Compound%20Semiconductor%20MANufacturing%20TECHnology.%20Digest%20of%20Papers
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