Metadata only
Datum
2004Typ
- Conference Paper
ETH Bibliographie
yes
Altmetrics
Abstract
Full—band Monte Carlo simulations are performed for n—type FinFETs as well as for unstrained—Si and strained—Si fully—depleted (FD) SOI-MOSFETs. Gate lengths of 50 nm down to 10 nm are considered, and a fixed off—current of 100 nA/μzm is in each case ensured by adjusting the silicon film thickness. The FinFET shows the best scaling trend, but the strained-Si FDSOI-MOSFET always involves the largest absolute value for the on—current. However, the on—current decreases upon scaling to 10 nm which might stem from a larger influence of surface roughness scattering in thin Si films affecting most strongly quasi—ballistic transport in strained Si. The feature of a decreasing current is found to be absent in drift—diffusion simulation because this approach does not include quasi—ballistic transport. Mehr anzeigen
Publikationsstatus
publishedExterne Links
Buchtitel
Simulation of Semiconductor Processes and Devices 2004Seiten / Artikelnummer
Verlag
SpringerKonferenz
ETH Bibliographie
yes
Altmetrics