Advanced Stress, Strain And Geometrical Analysis In Semiconductor Devices
dc.contributor.author
Neels, Antonia
dc.contributor.author
Dommann, Alex
dc.contributor.author
Niedermann, Philippe
dc.contributor.author
Falub, Claudiu
dc.contributor.author
von Känel, Hans
dc.contributor.editor
Zschech, Ehrenfried
dc.contributor.editor
Ogawa, Shinichi
dc.contributor.editor
Ho, Paul S.
dc.date.accessioned
2017-06-09T08:30:33Z
dc.date.available
2017-06-09T08:30:33Z
dc.date.issued
2010
dc.identifier.isbn
978-0-7354-0855-5
dc.identifier.isbn
0-7354-0855-6
dc.identifier.issn
0094-243X
dc.identifier.issn
1551-7616
dc.identifier.other
10.1063/1.3527115
dc.identifier.uri
http://hdl.handle.net/20.500.11850/27595
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Advanced Stress, Strain And Geometrical Analysis In Semiconductor Devices
dc.type
Conference Paper
ethz.book.title
Stress-induced phenomena in metallization
ethz.journal.title
AIP Conference Proceedings
ethz.journal.volume
1300
ethz.journal.abbreviated
AIP Conf. Proc.
ethz.pages.start
114
ethz.pages.end
119
ethz.event
11th International Workshop on Stress-Induced Phenomena in Metallization 2010
ethz.event.location
Bad Schandau, Germany
ethz.event.date
April 12-14, 2010
ethz.identifier.nebis
006442657
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich, direkt::00012 - Lehre und Forschung, direkt::00007 - Departemente, direkt::02010 - Departement Physik / Department of Physics::02505 - Laboratorium für Festkörperphysik (LFP) / Laboratory for Solid State Physics (LFP)::03569 - Batlogg, Bertram (emeritus)
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich, direkt::00012 - Lehre und Forschung, direkt::00007 - Departemente, direkt::02010 - Departement Physik / Department of Physics::02505 - Laboratorium für Festkörperphysik (LFP) / Laboratory for Solid State Physics (LFP)::03569 - Batlogg, Bertram (emeritus)
ethz.date.deposited
2017-06-09T08:30:48Z
ethz.source
ECIT
ethz.identifier.importid
imp59364d7c1bd9991617
ethz.ecitpid
pub:46441
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-24T08:52:32Z
ethz.rosetta.lastUpdated
2024-02-01T16:37:23Z
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.atitle=Advanced%20Stress,%20Strain%20And%20Geometrical%20Analysis%20In%20Semiconductor%20Devices&rft.jtitle=AIP%20Conference%20Proceedings&rft.date=2010&rft.volume=1300&rft.spage=114&rft.epage=119&rft.issn=0094-243X&1551-7616&rft.au=Neels,%20Antonia&Dommann,%20Alex&Niedermann,%20Philippe&Falub,%20Claudiu&von%20K%C3%A4nel,%20Hans&rft.isbn=978-0-7354-0855-5&0-7354-0855-6&rft.genre=proceeding&rft_id=info:doi/10.1063/1.3527115&rft.btitle=Stress-induced%20phenomena%20in%20metallization
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