Comparison of Charge Dissipation Layers and Dose Sensitivity of PMMA Electron Beam Lithography on Transparent Insulating Substrates such as GaN
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Date
2017Type
- Conference Paper
ETH Bibliography
yes
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Publication status
publishedBook title
Digest of Papers from the International Conference on Compound Semiconductor Manufacturing Technology (CS ManTech 2017)Publisher
IOP PublishingEvent
Subject
E-beam evaporation; resist; charging dissipation layerOrganisational unit
03721 - Bolognesi, Colombo / Bolognesi, Colombo
02205 - FIRST-Lab / FIRST Center for Micro- and Nanoscience
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ETH Bibliography
yes
Altmetrics