Comparison of Ion-Milling and IonSputtering to Remove Edge Roughness of EBL Defined Emitter Metallization in InP/GaAsSb DHBTs
Metadata only
Datum
2017Typ
- Conference Paper
ETH Bibliographie
yes
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Publikationsstatus
publishedBuchtitel
2017 International Conference on Compound Semiconductor MANufacturing TECHnology. Digest of PapersSeiten / Artikelnummer
Verlag
CS MANTECHKonferenz
Thema
edge roughness; ion-milling; ion-sputtering; InP/GaAsSb DHBTsOrganisationseinheit
03721 - Bolognesi, Colombo / Bolognesi, Colombo
02205 - FIRST-Lab / FIRST Center for Micro- and Nanoscience
ETH Bibliographie
yes
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